BS ISO 17109:2015
表面化學分析. 深度剖析. 使用單層和多層薄膜測定X射線光電子能譜, 俄歇電子能譜以及二次離子質譜法濺射深度剖析中濺射率的方法
Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films